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Sematech forum to tackle transition to 22nm

Sematech forum to tackle transition to 22nm
The Sematech consortium is planning to host a three-day lithography forum May 12-14 because it is concerned about the growing uncertainty on the approach manufacturers and suppliers should take to transition from the 32nm to the 22nm half-pitch technology node.
2008-03-31 00:00:00
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